TY  - JOUR

T1  - Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl-2/Ar-Based Inductively Coupled Plasma Dry Etching

JO  - J ELECTRON MATER

PY  - 2009/05/01

AU  - Dylewicz R

AU  - Patela S

AU  - Hogg RA

AU  - Fry PW

AU  - Parbrook PJ

AU  - Airey R

AU  - Tahraoui A

ED  - 

DO  - DOI: 10.1007/s11664-009-0731-5

VL  - 38

IS  - 5

SP  - 635

EP  - 639

Y2  - 2024/09/20

ER  -